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发明名称
Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauelemente mit einer derartigen Projektionsbelichtungsanlage
摘要
申请公布号
DE102007009334(B4)
申请公布日期
2009.05.14
申请号
DE200710009334
申请日期
2007.02.22
申请人
CARL ZEISS SMT AG
发明人
SHAFER, DAVID;ZELLNER, JOHANNES;ULRICH, WILHELM;FELDMANN, HEIKO
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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