| 摘要 |
The present disclosure is directed a method for, preparing a photomask pattern. The method comprises receiving drawn pattern data from a design database. The drawn pattern data describes two or more adjacent feature ends that are positioned at different locations along a y-axis. A photomask pattern is formed for patterning the feature ends, wherein the photomask pattern will result in the feature ends being positioned at the same location along the y-axis.
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