| 摘要 |
<P>PROBLEM TO BE SOLVED: To simply and accurately measure the defocusing amount, in an exposure device. <P>SOLUTION: The exposure mask 10 has a focus measuring pattern formed on the mask base plate 11, and this focus measuring pattern has a first pattern group 15a, including at least three first patterns 22a arranged with a first pitch, and a second pattern group 15b, including at least three second patterns 22b arranged with a second pitch different from the first pitch; and the first and second pattern groups 15a, 15b are constituted of plural recessed regions and projecting regions formed on the mask base plate 11. <P>COPYRIGHT: (C)2009,JPO&INPIT |
