发明名称 |
REMOVABLE COVER FOR PROTECTING RETICLE, SYSTEM INCLUDING THE COVER, AND METHOD OF USING THE COVER |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a removable cover for protecting a reticle used in a lithography system. <P>SOLUTION: The removable cover includes a frame and a membrane supported by the frame. The membrane is transparent to an inspection wavelength such that the reticle can be inspected with the removable cover in place. This removable cover protects the reticle when the removable cover is in place and is removable for lithographic exposure. The removable cover can further include at least one reticle fastener. At least the one fastener applies force to the reticle thereby preventing movement of the removable cover relative to the reticle when the removable cover is in place. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009104187(A) |
申请公布日期 |
2009.05.14 |
申请号 |
JP20090025411 |
申请日期 |
2009.02.05 |
申请人 |
ASML HOLDING NV |
发明人 |
CATEY ERIC B;HULT DAVID;DEL PUERTO SANTIAGO;ROUX STEPHEN |
分类号 |
G03F1/62;G03F1/66;G03F7/20;H01L21/027;H01L21/673 |
主分类号 |
G03F1/62 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|