| 摘要 |
<P>PROBLEM TO BE SOLVED: To irradiate a region wider than a mask surface with detection light to measure a surface position of the region even when a protective member is arranged on the mask surface through a support member. <P>SOLUTION: An exposure device exposing a wafer W to light through a non-telecentric projection optical system PO on a reticle surface side with exposure light from a pattern on a reflective reticle surface Ra includes: a light transmission system 31A projecting an image of a slit 34a on the reticle surface Ra by the detection light DL; and a light reception system 31B forming the image of the slit by receiving the detection light DL through the projection optical system PO, a reflective plate 53, the projection optical system PO and the reticle surface Ra after being reflected by the reticle surface Ra. <P>COPYRIGHT: (C)2009,JPO&INPIT |
