| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a defect correction method capable of correcting easily a micro pattern omission defective part, without imparting a damage in the vicinity of the defective part and without generating contamination. <P>SOLUTION: In this defect correction method, a small hole 10a having a shape in response to a white defective part 5a of a color filter substrate 1, and smaller than the white defective part 5a, is formed in the film 10 by laser irradiation, an opening part of the hole 10a is opposed to the white defective part 5a with a clearance, a prescribed range including the hole 10a is pressed by a flat face 18a of an application needle 18 tip deposited with correction ink 17, and the correction ink 17 is applied onto the white defective part 5a. The correction ink 17 is thereby prevented from being absorbed clearance between a protrusion 7 and an end part 10b of the hole 10a on a black matrix 3 neighboring to the white defective part 5a. <P>COPYRIGHT: (C)2009,JPO&INPIT |
