发明名称 |
WAVELENGTH SELECTIVE ELEMENT, MANUFACTURING APPARATUS FOR WAVELENGTH SELECTIVE ELEMENT, METHOD OF MANUFACTURING WAVELENGTH SELECTIVE ELEMENT, LIGHT SOURCE DEVICE, IMAGE DISPLAY DEVICE, AND MONITOR |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a wavelength selective element capable of reducing coherence among a plurality of laser beams and suppressing speckle noise with a simple configuration, to provide a manufacturing apparatus for the wavelength selective element, to provide a light source device, and to provide an image display device. <P>SOLUTION: The wavelength selective element comprises: one base member; a plurality of light selective regions formed in the base member, in which a predetermined selective wavelength is selected from among laser beams emitted from a plurality of light emission elements of emitting the laser beams; and interference regions (a) to (d) having interference fringes formed therein, each of which is disposed on each of the plurality of light emission elements (A) to (D), wherein a spacing of interference fringe of at least one of interference regions (a) to (d) differs from the spacing of interference fringes of remaining interference regions (a) to (d). <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009104196(A) |
申请公布日期 |
2009.05.14 |
申请号 |
JP20090027372 |
申请日期 |
2009.02.09 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SUMIYAMA FUMIKA;UEJIMA SHUNJI |
分类号 |
G02B5/20;G02B5/18;G02F1/01;G02F1/37;G03B21/00;G03F7/20;H01L21/027 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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