发明名称 WAVELENGTH SELECTIVE ELEMENT, MANUFACTURING APPARATUS FOR WAVELENGTH SELECTIVE ELEMENT, METHOD OF MANUFACTURING WAVELENGTH SELECTIVE ELEMENT, LIGHT SOURCE DEVICE, IMAGE DISPLAY DEVICE, AND MONITOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a wavelength selective element capable of reducing coherence among a plurality of laser beams and suppressing speckle noise with a simple configuration, to provide a manufacturing apparatus for the wavelength selective element, to provide a light source device, and to provide an image display device. <P>SOLUTION: The wavelength selective element comprises: one base member; a plurality of light selective regions formed in the base member, in which a predetermined selective wavelength is selected from among laser beams emitted from a plurality of light emission elements of emitting the laser beams; and interference regions (a) to (d) having interference fringes formed therein, each of which is disposed on each of the plurality of light emission elements (A) to (D), wherein a spacing of interference fringe of at least one of interference regions (a) to (d) differs from the spacing of interference fringes of remaining interference regions (a) to (d). <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009104196(A) 申请公布日期 2009.05.14
申请号 JP20090027372 申请日期 2009.02.09
申请人 SEIKO EPSON CORP 发明人 SUMIYAMA FUMIKA;UEJIMA SHUNJI
分类号 G02B5/20;G02B5/18;G02F1/01;G02F1/37;G03B21/00;G03F7/20;H01L21/027 主分类号 G02B5/20
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