COMPOSITION FOR FILM FORMATION, AND INSULATING FILM CONTAINING SAME

摘要

PROBLEM TO BE SOLVED: To provide a composition for film formation containing a composition serving as a material suitably used to form a coating filming film excellent in any characteristics of a low dielectric constant, humidity resistance, water resistance and heat resistance. SOLUTION: A compound containing a borazine ring and an adamantane ring is provided. The composition for film formation is also provided which contains: a compound containing the borazine ring and adamantane ring; or a compound containing the borazine ring and a compound containing the adamantane ring; or the compound containing the borazine ring and adamantane ring and the compound containing the borazine ring and/or the compound containing the adamantane ring. COPYRIGHT: (C)2009,JPO&INPIT