<p>A method (10) of cleaning an object in an open aqueous cleaning system uses an open cleaning vessel (12) into which water used for cleaning a material or object can be introduced. A means is provided for introducing a reactant chemical (46) to the vessel to form an aqueous solution. Cleaning of the surface is in the form of bubble formation on the part that vaporizes the chemical in order to react the oxidizer in the vapor state to the exposed surface at the bubble growth area. Treatment in the form of etching or any other process in which material is removed from a solid surface displaces the liquid residue from the surface. The resulting process produces no dissolution or emulsion of the contaminant and therefore can be easily separated from the chemical cleaner.</p>
