发明名称 COATING COMPOSITION USED WITH OVERCOATED PHOTORESIST
摘要 <P>PROBLEM TO BE SOLVED: To provide anti-reflective coating compositions useful for being used with an overcoated photoresist layer to manufacture integrated circuits. <P>SOLUTION: In a first aspect, organic coating compositions are provided, particularly spin-on anti-reflective coating compositions that contain a polyester resin component. In a further aspect, the coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009104165(A) 申请公布日期 2009.05.14
申请号 JP20090005680 申请日期 2009.01.14
申请人 ROHM & HAAS ELECTRONIC MATERIALS LLC 发明人 WAYTON GERALD B;TREFONAS PETER III;COLEY SUZANNE
分类号 G03F7/11;B32B27/06;B32B27/08;B32B27/36;C08G63/40;G03C1/76;G03C1/825;G03C1/835;G03F7/004;G03F7/039;G03F7/09;H01L21/027 主分类号 G03F7/11
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