| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a pattern film capable of obtaining the pattern film whose surface is formed with a concavo-convex pattern without carrying out development after a photosensitive resin composition layer is formed and the photosensitive resin composition layer is partially exposed. <P>SOLUTION: The manufacturing method of the pattern film 1A includes the steps of forming the photosensitive resin composition layer 1 having a predetermined thickness consisting of a photosensitive resin composition, partially exposing the photosensitive resin composition layer 1 so that the photosensitive resin composition layer 1 may have an exposed portion 1a irradiated with light and a non-exposed portion 1b not irradiated with light and the thickness of the exposed part 1a becomes relatively smaller than that of the non-exposed portion 1b, and baking the photosensitive resin composition layer 1 in the exposed portion 1a and the non-exposed portion 1b without carrying out development after the exposure. <P>COPYRIGHT: (C)2009,JPO&INPIT |
