发明名称 |
PHOTOVOLTAICS WITH INTERFEROMETRIC MASKS |
摘要 |
An interferometric mask 300 covering the front electrodes 910, 91 1 of a photovoltaic device 900 is disclosed. Such an interferometric mask 300 may reduce reflections of incident light from the electrodes 910, 911. In various embodiments, the mask reduces reflections so that a front electrode 910, 911 pattern appears similar in color to adjacent regions of visible photovoltaic active material. |
申请公布号 |
WO2009061632(A2) |
申请公布日期 |
2009.05.14 |
申请号 |
WO2008US81373 |
申请日期 |
2008.10.27 |
申请人 |
QUALCOMM MEMS TECHNOLOGIES, INC.;KOTHARI, MANISH;KHAZENI, KASRA |
发明人 |
KOTHARI, MANISH;KHAZENI, KASRA |
分类号 |
H01L31/0216 |
主分类号 |
H01L31/0216 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|