| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device in which uniformity of plasma generated is excellent while loss is made small. <P>SOLUTION: When the plasma is generated and formed by applying high frequency by connecting matching boxes 21-23 and RF power sources 17-19 independently to a plurality of coils 14-16, a belt-like metal ring is arranged as an installation conductor between each coils 14-16 and, thereby, electromagnetic coupling between each coils 14-16 is blocked or alleviated, and a precise impedance matching is assured while preventing a failure of the matching boxes 21-23, and furthermore, by dare not arranging the belt-like metal ring on the outside of the outermost periphery coil 16, it is possible to reduce the loss. <P>COPYRIGHT: (C)2009,JPO&INPIT |
