发明名称 |
Fotoempfindliche Kunststoffzusammensetzung, Verfahren zur Herstellung von Reliefmustern, und elektronische Bauteile |
摘要 |
A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (-NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting group from the acid group, is employed to form layers of a semiconductor device. |
申请公布号 |
DE60326907(D1) |
申请公布日期 |
2009.05.14 |
申请号 |
DE2003626907 |
申请日期 |
2003.05.16 |
申请人 |
HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. |
发明人 |
NUNOMURA, MASATAKA;OOE, MASAYUKI;NAKANO, HAJIME;TSUMARU, YOSHIKO;UENO, TAKUMI |
分类号 |
G03F7/027;G03F7/039;G03F7/023;H05K1/00 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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