| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent reflecting surfaces (reflecting surfaces of a Z interferometer) arranged on the side surface of stages from getting wetted with a liquid, in a liquid immersion area. <P>SOLUTION: When a transition is performed, from a state where one wafer stage WST1 is positioned in a region, including a liquid immersion area 14 to a state where another wafer stage WST2 is positioned in the area, including the liquid immersion area, waves sections 23a, 23b arranged in both wafer stages are to be engaged, to make a proximity or a contact state in the X-axis direction; and both stages WST1, WST2 are simultaneously driven in the X-axis direction, while maintaining the state. In this manner, the liquid immersion region 14 moves back and forth, between the two stages via the eaves sections. This can restrain leakage of the liquid via a gap between both wafer stages, and further, liquid leakage to the reflection surfaces 27e, 27f arranged on the side surface of both wafer stages can be restrained. Furthermore, the interference between the reflection surfaces arranged in both wafer stages can be avoided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
