| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography system incorporating interference lithography apparatuses, which makes it possible to scan over a substrate so as to expose continuous parts of a pattern on respective regions of the substrate and can be used for generating the densest portion of the pattern on the substrate. <P>SOLUTION: The lithography system includes two lithography apparatuses. The first lithography apparatus projects a radiation beam with a pattern on a first target portion of the substrate, and the second lithography apparatus includes an interference arrange which splits the radiation beam and recombines the split beams to generate an interference pattern. A masking arrange selectively transmits a part of the interference pattern, and a projection system transfers the selectively transmitted part of the interference pattern on a second target portion of the substrate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
