发明名称 APPARATUS AND METHOD FOR INSPECTING DEFECT IN OBJECT SURFACE
摘要 PROBLEM TO BE SOLVED: To achieve a defect inspection apparatus capable of accurately inspecting micro foreign matter or defect at a high speed for an inspection target substrate in which a repetitive pattern and a non-repetitive pattern are mixed. SOLUTION: In a foreign matter anti-adhesive means 180, a transparent plate 187 is placed on a placement table 34 through a frame 185. In the foreign matter anti-adhesive means 180, a shaft 181 which is rotatably supported by two columnar supports 184 fixed onto a base 186 is coupled to a motor 182 by a coupling 183. The shaft 181 is inserted into a part of a frame 185 between the two columnar supports 184 such that the frame 185 and the transparent plate 187 are turnable about the shaft 181. Therefore, the whole of the frame 185 is opened and closed in a Z-direction about the shaft 181, and a wafer 1 on the placement table 34 can be covered with the frame 185 and the transparent plate 187. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009103694(A) 申请公布日期 2009.05.14
申请号 JP20080256945 申请日期 2008.10.02
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 UTO YUKIO;NISHIYAMA HIDETOSHI;NOGUCHI MINORU
分类号 G01N21/956;H01L21/66 主分类号 G01N21/956
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