METHOD FOR MANUFACTURING PHASE SHIFT MASK BLANK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD FOR TRANSFERRING PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a phase shift mask blank having a light translucent film or a light translucent portion having the designated phase angle and transmittance and being superior in film characteristics such as chemical resistance, light resistance, and internal stress.

SOLUTION: The method for manufacturing a halftone phase shift mask blank having a translucent film on a transparent substrate comprises: forming a translucent film containing nitrogen, metal and silicon and having a compressive stress on a transparent substrate by sputtering a target containing 70 to 95 mol% silicon and metal in an atmosphere containing nitrogen on the transparent substrate; and heat treating the translucent film at a temperature higher than a baking temperature of a resist film to be formed on the translucent film so as to reduce the internal stress of the translucent film.

COPYRIGHT: (C)2009,JPO&INPIT