EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a device suppressing degradation of a device caused by a liquid attached to a substrate after exposure when exposure is made with the liquid with which a space between a projection optical system and the substrate is filled, and also to provide an exposure apparatus incorporating the device.

SOLUTION: The exposure apparatus exposes a substrate by transferring a pattern image on the substrate through the liquid. The exposure apparatus includes: the projection optical system for projecting the pattern image on the substrate; and a cleaning device for cleaning the exposed substrate before the substrate is conveyed to a treatment device for treating the exposed substrate.

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