| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method capable of manufacturing a device by detecting substrate surface position information precisely even when a refractive index on a light path of a detection light of an AF detection system changes. <P>SOLUTION: The exposure method is a method in which a substrate is exposed by projecting an image of a mask pattern on the substrate by a projection optical system. The exposure method includes detecting refractive index information of light paths of detection light and reflection light, and projecting the image of the mask pattern on the substrate by the projection optical system, by projecting a plurality of detection lights on a surface of the substrate at different incident angles, and by receiving reflection lights from the surface of the substrate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
