发明名称 |
Apparatus and Method for Wafer Edge Exclusion Measurement |
摘要 |
A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. An automatic defect characterization processor is provided.
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申请公布号 |
US2009122304(A1) |
申请公布日期 |
2009.05.14 |
申请号 |
US20080188887 |
申请日期 |
2008.08.08 |
申请人 |
ACCRETECH USA, INC. |
发明人 |
JIN JU;SADAM SATISH;VERMA VISHAL;HUANG ZHIYAN;LIN SIMING;ROBBINS MICHAEL D.;FORDERHASE PAUL F. |
分类号 |
G01N21/88;H05B37/02 |
主分类号 |
G01N21/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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