发明名称 |
GAXIN1-XN SUBSTRATE AND GAXIN1-XN SUBSTRATE CLEANING METHOD |
摘要 |
<p>Affords Ga x In 1- x N substrates onto which high-quality epitaxial films can be stably grown, and cleaning methods for manufacturing the Ga x In 1- x N substrates. Ga x In 1- x N substrate in which the number of particles of not less than 0.2 µm particle size present on the Ga x In 1- x N substrate surface is 20 or fewer, given that the Ga x In 1- x N substrate diameter is 2 inches. Furthermore, a Ga x In 1- x N substrate in which in a photoelectron spectrum along the Ga x In 1- x N substrate surface by X-ray photoelectron spectroscopy at a take-off angle of 10°, the ratio between the peak areas of the C1 s electron and N1 s electron (C 1 s electron peak area/N 1 s electron peak area) is 3 or less.</p> |
申请公布号 |
KR20090048550(A) |
申请公布日期 |
2009.05.14 |
申请号 |
KR20087032119 |
申请日期 |
2008.12.30 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
UEMURA TOMOKI;NAKAHATA HIDEAKI |
分类号 |
H01L21/302;B08B3/08;B08B3/12;H01L21/304;H01L33/32 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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