Chemical amplification resist composition and pattern-forming method using the same

摘要

The present invention relates to a chemical amplification resist composition comprising:
(A) a resin increasing the solubility in an alkali developer by the action of an acid;
(B) a compound capable of generating an acid upon irradiation with actinic ray or radiation;
(C) a compound having a pKa value of 4-15 selected from formulae (FAD-II) and (FAD-III):
<Chemistry id="chema01" num="0001"><Image id="ia01" he="33" wi="125" file="IMGA0001.TIF" imgContent="chem" imgFormat="TIFF" /></Chemistry>
wherein
R<Sub>a105</Sub> each individually is F or perfluoroalkyl;
n is 1 or 2, and (n+m) = 6;
R<Sub>a106</Sub> each individually is F or perfluoroalkyl; and
A<Sub>a102</Sub> is a bond or a divalent organic group; and

(D) a solvent.

Also, the invention relates to a pattern-forming method comprising; forming a resist film with the above composition and exposing and developing the resist film