发明名称 Method and apparatus for measuring electron density of plasma and plasma processing apparatus
摘要 An apparatus for measuring plasma electron density precisely measures electron density in plasma even under a low electron density condition or high pressure condition. This plasma electron density measuring apparatus includes a vector network analyzer in a measuring unit, which measures a complex reflection coefficient and determines a frequency characteristic of an imaginary part of the coefficient. A resonance frequency at a point where the imaginary part of the complex reflection coefficient is zero-crossed is read and the electron density is calculated based on the resonance frequency by a measurement control unit.
申请公布号 US7532322(B2) 申请公布日期 2009.05.12
申请号 US20060566340 申请日期 2006.12.04
申请人 发明人
分类号 G01J3/30;H05H1/00;C23C16/52;C23F4/00;G01N23/00;H01J37/32;H01L21/302;H01L21/3065;H01L21/311;H01L21/461;H01L21/66;H05H1/46 主分类号 G01J3/30
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