发明名称 |
Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
摘要 |
An apparatus for measuring plasma electron density precisely measures electron density in plasma even under a low electron density condition or high pressure condition. This plasma electron density measuring apparatus includes a vector network analyzer in a measuring unit, which measures a complex reflection coefficient and determines a frequency characteristic of an imaginary part of the coefficient. A resonance frequency at a point where the imaginary part of the complex reflection coefficient is zero-crossed is read and the electron density is calculated based on the resonance frequency by a measurement control unit.
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申请公布号 |
US7532322(B2) |
申请公布日期 |
2009.05.12 |
申请号 |
US20060566340 |
申请日期 |
2006.12.04 |
申请人 |
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发明人 |
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分类号 |
G01J3/30;H05H1/00;C23C16/52;C23F4/00;G01N23/00;H01J37/32;H01L21/302;H01L21/3065;H01L21/311;H01L21/461;H01L21/66;H05H1/46 |
主分类号 |
G01J3/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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