发明名称 Complementary metal oxide semiconductor image sensor with multi-floating diffusion region
摘要 The present invention relates to a complementary metal oxide semiconductor (CMOS) image sensor. Particularly, a unit pixel of the complementary metal oxide semiconductor (CMOS) image sensor, wherein the unit pixel has a rectangular shape and is defined with the top region and the bottom region of which area is larger than that of the top region, the unit pixel including: a photodiode region disposed in entire areas of a bottom region of the unit pixel; a reset gate, a drive gate and a selection gate disposed in an upper part of a top region of the unit pixel; a multi-floating diffusion region disposed with a uniform size at least at two corners of the photodiode region; and a transfer gate disposed in an upper part of the photodiode region to thereby define the multi-floating diffusion region.
申请公布号 US7531858(B2) 申请公布日期 2009.05.12
申请号 US20030746521 申请日期 2003.12.23
申请人 MAGNACHIP SEMICONDUCTOR, LTD. 发明人 LEE WON-HO
分类号 H01L27/146;H01L31/062;H04N5/335;H04N5/361;H04N5/369;H04N5/374 主分类号 H01L27/146
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