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发明名称
METHOD FOR CORRECTING CRTICAL DEMENSION IN PHOTOMASK
摘要
申请公布号
KR20090047006(A)
申请公布日期
2009.05.12
申请号
KR20070112959
申请日期
2007.11.07
申请人
HYNIX SEMICONDUCTOR INC.
发明人
SHIN, JAE CHEON
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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