发明名称 |
Method for forming film pattern, method for manufacturing semiconductor device, liquid crystal television, and EL television |
摘要 |
An object of the invention is to provide a method for manufacturing a semiconductor device having a semiconductor element with a minute structure, which can reduce a cost and improve throughput due to a small number of steps and reduction in a material. One feature of the invention is to form a first film pattern over a substrate, form a second film pattern which is curved on the surface of the first film pattern or the substrate, and form a film pattern by irradiating the first film pattern with light with the second film pattern therebetween and modifying part of the second film pattern.
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申请公布号 |
US7531294(B2) |
申请公布日期 |
2009.05.12 |
申请号 |
US20050087829 |
申请日期 |
2005.03.24 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAMOTO YOSHIAKI;YAMAMOTO HIROKO;SUZUKI YUKIE |
分类号 |
G03F9/00;G03F1/14;G03F7/00;G03F7/20;H01L21/336;H01L21/768;H01L21/77 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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