发明名称 Method of forming CMOS imager pixels with capacitor structures
摘要 A charge storage capacitor which is connected to various light sensitive and/or electrical elements of a CMOS imager, as well as methods of formation, are disclosed. The charge storage capacitor may be formed entirely over a field oxide region of the CMOS imager, entirely over an active area of a pixel sensor cell, or partially over a field oxide region and partially over an active pixel area of a pixel sensor cell.
申请公布号 US7531379(B2) 申请公布日期 2009.05.12
申请号 US20030660565 申请日期 2003.09.12
申请人 MICRON TECHNOLOGY, INC. 发明人 RHODES HOWARD;MCKEE JEFF
分类号 H01L21/28;H01L27/146;H01L27/148;H01L29/768;H01L31/062 主分类号 H01L21/28
代理机构 代理人
主权项
地址