| 发明名称 |
Organometallic compounds |
| 摘要 |
Organometallic compounds containing an electron donating group-substituted alkenyl ligand are provided. Such compounds are particularly suitable for use as vapor deposition precursors. Also provided are methods of depositing thin films, such as by ALD and CVD, using such compounds.
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| 申请公布号 |
US7531458(B2) |
申请公布日期 |
2009.05.12 |
| 申请号 |
US20060540072 |
申请日期 |
2006.09.29 |
| 申请人 |
ROHM AND HAAS ELECTRONICS MATERIALS LLP |
发明人 |
SHENAI-KHATKHATE DEODATTA VINAYAK;WANG QING MIN |
| 分类号 |
H01L21/44;C07F5/00;C23C16/00 |
主分类号 |
H01L21/44 |
| 代理机构 |
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