发明名称 |
Circuit-pattern inspection apparatus |
摘要 |
The disclosed subject matter is related to a circuit pattern inspection apparatus for detecting a gradual changing of defect expanding over a large area of the semiconductor wafer. In order to detect a gradual changing of a defect related condition expanding over a large area of the semiconductor wafer, comparison is made between dies on a wafer that are separated from each other by a distance of at least one die width. For example, when a value according to a difference between such dies exceeds a pre-determined value, an existence of the gradual changing can be confirmed. |
申请公布号 |
US7532328(B2) |
申请公布日期 |
2009.05.12 |
申请号 |
US20070907562 |
申请日期 |
2007.10.15 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
NARA YASUHIKO;NOJIRI MASAAKI;HAYAKAWA KOUICHI;HIROI TAKASHI |
分类号 |
G01B11/00;G01N21/956;G03F1/08;G03F1/84;G03F1/86;G06F19/00;G06T1/00;G06T7/00;H01L21/027;H01L21/66 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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