发明名称 |
Microlithographic projection exposure apparatus |
摘要 |
A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
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申请公布号 |
US7532306(B2) |
申请公布日期 |
2009.05.12 |
申请号 |
US20040917371 |
申请日期 |
2004.08.13 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
DODOC AURELIAN;SCHUSTER KARL HEINZ;MALLMANN JOERG;ULRICH WILHELM;ROSTALSKI HANS-JUERGEN |
分类号 |
G03B27/42;G03B27/52;G03B27/54;G03F7/20 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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