| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition having high heat resistance, high transparency performance, and favorable sensitivity even if a low concentration developing liquid is used, and having excellent anti-alkali resistance in a cured film. <P>SOLUTION: The positive photosensitive composition shows an alkyl group selected from (a) polysiloxane, (b) a (meta)acrylic polymer, (c) a quinonediazide compound of a formula (1), in which R<SP>1</SP>represents a hydrogen atom, or selected from a 1-8C alkyl group. R<SP>2</SP>, R<SP>3</SP>and R<SP>4</SP>represent one of a hydrogen atom selected from the 1-8C alkyl group, an alkoxy group, a carboxyl group, or an ester group. The R<SP>2</SP>, R<SP>3</SP>and R<SP>4</SP>may be the same or different from one another. Q represents either of a 5-naphthoquinone-diazide sulfonyl group or a hydrogen atom, all of Q cannot be hydrogen atoms, and a, b, c, α and β represent integers of 0-4, but α+β≥3, and a (d) positive photosensitive composition containing solvent. <P>COPYRIGHT: (C)2009,JPO&INPIT |
