发明名称 METHOD FOR PRODUCING MULTILAYER STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a multilayer structure excellent in gas barrier properties under high-humidity conditions. SOLUTION: A method for producing a multilayer structure having a substrate layer, a first layer, and a second layer contiguous to the first layer comprises in the given order (1) the step of forming the first layer by coating the substrate layer with a first coating liquid containing a first fine inorganic particle, a first metal alkoxide, and a first aqueous medium to form a first coating film and removing the first aqueous medium from the first coating film and (2) the step of forming the second layer on the first layer by coating the first layer with a second coating liquid containing a second resin, a second inorganic layered compound, and a second liquid medium to form a second coating film and removing the second liquid medium from the second coating film. The average particle diameter of the first fine inorganic particle is 1μm or less. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009095764(A) 申请公布日期 2009.05.07
申请号 JP20070269861 申请日期 2007.10.17
申请人 SUMITOMO CHEMICAL CO LTD 发明人 OSAKI NOBUHIRO
分类号 B05D7/24;B05D1/36;B32B9/00;C08L83/02;C08L85/00 主分类号 B05D7/24
代理机构 代理人
主权项
地址