发明名称 |
METHOD FOR TREATING SUBSTRATE, METHOD FOR CONVEYING SUBSTRATE, AND APPARATUS FOR CONVEYING SUBSTRATE |
摘要 |
A method for treating a substrate before exposing the substrate to which a resist is applied, includes, rinsing the substrate to which a resist is applied, and holding the rinsed substrate in an atmosphere. The atmosphere substantially contains no moisture until conveying the substrate to an exposure apparatus.
|
申请公布号 |
US2009115978(A1) |
申请公布日期 |
2009.05.07 |
申请号 |
US20080261596 |
申请日期 |
2008.10.30 |
申请人 |
MATSUNAGA KENTARO;KAWAMURA DAISUKE;MIYOSHI SEIRO;SHIOBARA EISHI |
发明人 |
MATSUNAGA KENTARO;KAWAMURA DAISUKE;MIYOSHI SEIRO;SHIOBARA EISHI |
分类号 |
G03F7/38 |
主分类号 |
G03F7/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|