发明名称 HIGH-INJECTION HETEROJUNCTION BIPOLAR TRANSISTOR
摘要 <p>A method for manufacturing high-injection heterojunction bipolar transistor capable of being used as a photonic device is disclosed. A sub-collector layer is formed on a substrate. A collector layer is then deposited on top of the sub-collector layer. After a base layer has been deposited on top of the collector layer, a quantum well layer is deposited on top of the base layer. An emitter is subsequently formed on top of the quantum well layer.</p>
申请公布号 WO2009058580(A1) 申请公布日期 2009.05.07
申请号 WO2008US80160 申请日期 2008.10.16
申请人 BAE SYSTEMS INFORMATION AND ELECTRONIC SYSTEMS INTEGRATION INC.;CAROTHERS, DANIEL, N.;POMERENE, ANDREW, T.S. 发明人 CAROTHERS, DANIEL, N.;POMERENE, ANDREW, T.S.
分类号 H01L21/8249 主分类号 H01L21/8249
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