<p>A method for manufacturing high-injection heterojunction bipolar transistor capable of being used as a photonic device is disclosed. A sub-collector layer is formed on a substrate. A collector layer is then deposited on top of the sub-collector layer. After a base layer has been deposited on top of the collector layer, a quantum well layer is deposited on top of the base layer. An emitter is subsequently formed on top of the quantum well layer.</p>
申请公布号
WO2009058580(A1)
申请公布日期
2009.05.07
申请号
WO2008US80160
申请日期
2008.10.16
申请人
BAE SYSTEMS INFORMATION AND ELECTRONIC SYSTEMS INTEGRATION INC.;CAROTHERS, DANIEL, N.;POMERENE, ANDREW, T.S.