发明名称 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <p>A measurement apparatus which measures a transmittance distribution of an optical system, comprises a light source, a first spherical mirror which forms reference light by reflecting light which is emitted by the light source and is not transmitted through the optical system, a second spherical mirror which forms test light by reflecting light which is emitted by the light source and is transmitted through the optical system, a measurement unit which measures intensity distributions of the reference light and the test light, a unit which calculates reflectance distributions of the first spherical mirror and the second spherical mirror, and an arithmetic unit which calculates a transmittance distribution on a pupil plane of the optical system, on the basis of the intensity distributions of the reference light and the test light, and the reflectance distributions of the first spherical mirror and the second spherical mirror.</p>
申请公布号 KR20090045009(A) 申请公布日期 2009.05.07
申请号 KR20080101866 申请日期 2008.10.17
申请人 CANON KABUSHIKI KAISHA 发明人 HAYASHI NAOTO
分类号 H01L21/66;H01L21/027 主分类号 H01L21/66
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