发明名称 THERMAL INTERFACE MATERIALS, METHODS OF PRODUCTION AND USES THEREOF
摘要 <p>Thermal interface materials comprise at least one silicon-based polymer and are formed from a combination of at least one silicon-based material, at least one catalyst and at least one elasticity promoter. In some embodiments, contemplated materials are also formed utilizing at least one polymerization component. Thermal interface materials are also disclosed that are capable of withstanding temperatures of at least 250C where the material comprises at least one silicon-based polymer coupled with at least one elasticity promoter. Methods of forming these thermal interface materials comprise providing each of the at least one silicon-based material, at least one catalyst and at least one elasticity promoter, blending the components and optionally including the at least one polymerization component. Contemplated thermal interface materials disclosed are thermally stable, sticky, and elastic, and show a good thermal conductivity and strong adhesion when deposited on the high thermally conductive material. The thermal interface materials may then be utilized as formed or the materials may be cured pre- or post-application of the thermal interface material to the surface, substrate or component.</p>
申请公布号 WO2009058794(A2) 申请公布日期 2009.05.07
申请号 WO2008US81487 申请日期 2008.10.29
申请人 HONEYWELL INTERNATIONAL INC.;BURNHAM, KIKUE S.;FAN, WENYA 发明人 BURNHAM, KIKUE S.;FAN, WENYA
分类号 C08L83/04;C08G77/00;C08K3/08 主分类号 C08L83/04
代理机构 代理人
主权项
地址