发明名称 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To obtain high resolution and an excellent exposure characteristic by faithfully and excellently transferring and exposuring a complicated micropattern including the intersecting portion of a line not only at optimal focus but also at some degree of defocus. <P>SOLUTION: Deformed lighting 40 includes a shading region 41a at the center portion and a ring band-shaped transmission region 41b of illumination light formed in a ring band shape at the periphery of the shading region 41a. Polarization is lateral at light transmission portions 42a and 42b set at upper and lower portions. Polarization is longitudinal at light transmission portions 42c and 42d set at right and left portions. Polarization is orthogonal at four light transmission portions 42e-42h set at slant portions. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009099623(A) 申请公布日期 2009.05.07
申请号 JP20070267181 申请日期 2007.10.12
申请人 FUJITSU MICROELECTRONICS LTD 发明人 KAMATSUKI KAZUO
分类号 H01L21/027 主分类号 H01L21/027
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