| 发明名称 |
Microlithography projection objective |
| 摘要 |
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
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| 申请公布号 |
US2009115986(A1) |
申请公布日期 |
2009.05.07 |
| 申请号 |
US20060916162 |
申请日期 |
2006.05.23 |
| 申请人 |
CARL ZEISS SMT AG |
发明人 |
FELDMANN HEIKO;KRAEHMER DANIEL;PERRIN JEAN-CLAUDE;KALLER JULIAN;DODOC AURELIAN;KAMENOV VLADIMIR;CONRADI OLAF;GRUNER TORALF;OKON THOMAS;EPPLE ALEXANDER |
| 分类号 |
G03F7/20;G02B17/08 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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