| 摘要 |
The invention relates to a method for forming a thin, high hardness coating and devices comprising it. The method of the invention consists in depositing, by magnetron cathode sputtering, a titanium film on at least one surface of a substrate under a partial pressure of argon of 1 Pa, then in depositing, by magnetron cathode sputtering, a titanium nitride film, onto the film obtained by introducing nitrogen into the cathodic sputtering chamber while maintaining a partial pressure of 1 Pa, and in depositing a film of a composite nanostructured material based on titanium, zirconium, boron and nitrogen onto the film obtained by magnetron cathode sputtering in active co-sputtering mode. The method of the invention can be applied in many fields, and in particular in the mechanical field in order to improve the surface hardness of mechanical components.
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