发明名称 Immersion lithography apparatus
摘要 A sampler, sample holder and an immersion lithographic apparatus comprising a sampler is disclosed. In an embodiment, a sampler is provided to collect particles in an immersion system of a lithographic apparatus. The sampler comprises a holder base having a collector surface. The collector surface is configured to collect and store contaminants. The sampler may be located on a surface of the immersion system so as to collect sample particles by contact of the collector surface with a liquid or with a surface of the immersion system. The sampler may be removable from the immersion lithographic apparatus for inspection.
申请公布号 US2009115979(A1) 申请公布日期 2009.05.07
申请号 US20080289537 申请日期 2008.10.29
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS;KRAMER RONALD HARM GUNTHER;VAN DEN BOGAARD FREDERIK JOHANNES;JANSSEN PETER GERARDUS HUBERTUS MARIA
分类号 G03B27/62 主分类号 G03B27/62
代理机构 代理人
主权项
地址