发明名称 LASER PROCESSING METHOD
摘要 <p>A laser beam (L), i.e., a pulsed laser beam, is radiated with a pulse width of 31ns-54ns and a pulse pitch of 7.5µm-10µm, to form a modified region (7) to be a cut start point along a planned cut line (5) on a GaAs substrate (12). Thus, the modified region (7) formed on the GaAs substrate (12) along the planned cut line (5) permits cracks to be easily generated in the thickness direction of the processing object (1). Therefore, the modified region (7) having extremely high function as the cut start point is formed on the board-like processing object (1) provided with the GaAs substrate (12).</p>
申请公布号 WO2009057558(A1) 申请公布日期 2009.05.07
申请号 WO2008JP69462 申请日期 2008.10.27
申请人 HAMAMATSU PHOTONICS K.K.;KUMAGAI, MASAYOSHI 发明人 KUMAGAI, MASAYOSHI
分类号 B23K26/38;B23K26/00;B23K26/06;B23K26/40;B23K101/40 主分类号 B23K26/38
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