METHOD FOR FABRICATING CONTACT HOLE IN SEMICONDUCTOR DEVICE,申请号KR20070111161-传众专利搜索

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发明名称	METHOD FOR FABRICATING CONTACT HOLE IN SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20090044880(A)	申请公布日期	2009.05.07
申请号	KR20070111161	申请日期	2007.11.01
申请人	HYNIX SEMICONDUCTOR INC.	发明人	CHO, SANG HOON
分类号	H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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