发明名称 LIGHTING OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD
摘要 There is disclosed an illumination optical apparatus which illuminates a surface to be illuminated on the basis of light from a light source, comprising, a first polarizing member arranged as rotatable around an optical axis of the illumination optical apparatus or around an axis substantially parallel to the optical axis; and a second polarizing member arranged as rotatable around the optical axis or around said axis substantially parallel thereto in an optical path between the first polarizing member and the surface to be illuminated, wherein each of the first polarizing member and the second polarizing member provides incident light with variations in a polarization state different according to respective positions of incidence.
申请公布号 US2009115989(A1) 申请公布日期 2009.05.07
申请号 US20060093303 申请日期 2006.10.30
申请人 TANAKA HIROHISA 发明人 TANAKA HIROHISA
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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