发明名称 Saturable absorber mirror for use as mode coupler for pulse lasers, has mechanical distance piece provided for changing thickness of air layer, which is formed between saturable absorber layer system and dielectric Bragg-mirror
摘要 <p>#CMT# #/CMT# The mirror has a saturable absorber layer system (1) arranged on a gallium arsenide-semiconductor substrate (2), and a highly reflecting, dielectric Bragg-mirror (3) that is arranged on a glass substrate (4). An air layer (8) with a thickness in a range of 1 micrometer to 100 micrometer is formed between the layer system and the Bragg-mirror. A mechanical distance piece (9) is provided for changing the thickness of the air layer, and has a piezoelectric adjusting unit, where the Bragg-mirror is manufactured through a sputtering or vapor deposition method. #CMT#USE : #/CMT# Saturable absorber mirror for use as mode coupler for mode coupling of pulse lasers. #CMT#ADVANTAGE : #/CMT# The Bragg-mirror is manufactured through the sputtering or vapor deposition method even for larger wavelengths in a cost-effective manner. The mechanical distance piece is provided for changing the thickness of the air layer, thus adjusting the saturable absorption and saturation fluency of the absorber mirror to a value required for the operation of the pulse lasers. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The drawing shows a cross-sectional view of a saturable absorber mirror. 1 : Saturable absorber layer system 2 : Gallium arsenide-semiconductor substrate 3 : Bragg-mirror 4 : Glass substrate 8 : Air layer 9 : Distance piece.</p>
申请公布号 DE102008013925(B3) 申请公布日期 2009.05.07
申请号 DE20081013925 申请日期 2008.03.12
申请人 BATOP GMBH 发明人 HOHMUTH, RICO;RICHTER, WOLFGANG
分类号 H01S5/065;G02F1/35;H01S3/098 主分类号 H01S5/065
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