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发明名称
EXPOSURE MASK FOR ALIGNMENT KEY AND METHOD FOR FORMING ALIGNMENT KEY USING THE SAME
摘要
申请公布号
KR20090044591(A)
申请公布日期
2009.05.07
申请号
KR20070110732
申请日期
2007.10.31
申请人
HYNIX SEMICONDUCTOR INC.
发明人
MA, WON KWANG
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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