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发明名称
THE PHOTO MASK AND METHOD FOR MANUFACTURING THE PHOTO NASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
摘要
申请公布号
KR20090044534(A)
申请公布日期
2009.05.07
申请号
KR20070110669
申请日期
2007.10.31
申请人
HYNIX SEMICONDUCTOR INC.
发明人
EOM, TAE SEUNG
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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