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发明名称
METHOD FOR FABRICATING PHOTOMASK
摘要
申请公布号
KR20090044410(A)
申请公布日期
2009.05.07
申请号
KR20070110499
申请日期
2007.10.31
申请人
HYNIX SEMICONDUCTOR INC.
发明人
KIM, SANG CHUL
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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