| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid jetting head and a liquid jetting apparatus capable of improving liquid supply characteristics and liquid jetting characteristics by preventing retention of bubbles. SOLUTION: A protective substrate 30 is provided with a reservoir part 31 serving as a common liquid chamber of a plurality of pressure generating chambers 12, over the juxtaposed direction of the pressure generating chambers 12. The reservoir part 31 is provided with a first reservoir part 33 provided penetrating the protective substrate 30 in the thickness direction, and a second reservoir part 34 of recessed shape provided communicating with the first reservoir part 33 on the region side facing a holding part 32 on the side opposite to a passage forming substrate 10. The second reservoir part 34 is composed of a deep groove part 35 provided in a region facing a lead-in port 46, over the longitudinal direction of the pressure generating chambers 12 until reaching the first reservoir part 33, and shallow groove parts 36 shallower in depth than the deep groove part 35 and provided on both sides of the deep groove part 35 in the juxtaposed direction of the pressure generating chambers 12. COPYRIGHT: (C)2009,JPO&INPIT
|
