| 摘要 |
Embodiments of the invention integrate carbon nanotubes on a CMOS substrate using localized heating. An embodiment can allow the CMOS substrate to be in a room-temperature environment during the carbon nanotube growth process. Specific embodiments utilize a maskless post-CMOS microelectromechanical systems (MEMS) process. The post-CMOS MEMS process according to an embodiment of the present invention provides a carbon nanotube growth process that is foundry CMOS compatible. The maskless process, according to an embodiment, eliminates the need for photomasks after the CMOS fabrication and can preserve whatever feature sizes are available in the foundry CMOS process. Embodiments integrate single-walled carbon nanotube devices into a CMOS platform.
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